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陳建光

個人網站
材料科學與工程系(所)
 
學經歷:
  學歷:
國立交通大學 應用化學所 博士
國立清華大學 化學工程所 碩士

經歷:
國立臺灣科技大學 材料科學與工程學系 副教授 (2010/06 ~ 迄今)
國立臺灣科技大學 高分子工程系 助理教授 (2006/08 ~ 2010/05)
國立屏東科技大學 生物系統工程系 助理教授 (2005/08 ~ 2006/07)
日本東北大學 流體科學研究所 博士後研究員 (2004/09 ~ 2005/08)
國家研究院 奈米元件實驗室 助理研究員 (2000/02 ~ 2001/08)
工業技術研究院 化工與材料研究所 副研究員 (1999/02 ~ 2000/01)
 
專業技術
  高分子刷合成與應用、奈米纖維前瞻製成、奈米粒子、先進顯示器材料、磁性粒子應用。
   
專利介紹
  過濾元件及其製造方法  
The present invention provides metallic glass for ......
 

  細胞篩網、其製作方法、及使用該細胞篩網進行細胞篩選並計量之方法  
本創作主要將孔徑為 10~30 微米的篩網鍍金,使其具有導電性,並且塗佈生物抗沾黏材料以及
......
 

  使用繞射晶片之血液樣本檢測方法、裝置及系統  
本創作主要利用透明高分子結構設計出繞射圖案,經過表皮細胞抗體(EpCAM)表面改質後製作出的生醫偵測......
 

  光學癌細胞/細菌檢測試片及其檢測方法  
本創作主要利用透明高分子薄膜表面製備出一維以及二維圖案,包括線形與溝槽一維圖案以及洞與柱形二維陣列圖......
 

  熱致變色裝置  
本創作主要將環境感應水膠封入兩片玻璃中間,利用環境水膠的特性創做出智能玻璃,由於環境水膠的狀態會隨著......
 

  可變表面吸附力元件及其製造方法  
本創作在矽晶片上鍍上鋁層,並且接上電及通電,利用電壓的大小來控制表面溫度,再鍍上氮化矽層作為緩衝層,......
 

  感測方法、感測元件及其製造方法  
本創作將金屬玻璃濺鍍在一具有奈米孔洞的高分子模板上,此時金屬玻璃會沉積在高分子孔洞的底部以及孔洞的側......
 

  磁珠、製造該磁珠之方法及使用該磁珠之檢測方法及套組  
本創作主要將合成改質之磁珠結合抗體專一性抓取之特性,可以應用在血清中針對高密度脂蛋白
抓取與......
 

專利技術櫥窗
 


TCSM熱致變色智能材料之智慧綠能調光窗材應用

研究成果與計畫
 

教授課程

物理化學、高分子半導體、高等高分子物性、計算機概論、材料力學、微積分

榮譽獎項

榮升 國立臺灣科技大學材料科學與工程學系 副教授

榮升  國立臺灣科技大學材料科學與工程學系 教授

 期刊論文

1. Ging-Ho Hsiue, Jem-Kun Chen, Ying-Ling Liu, “Synthesis and Characterization of Nanocomposite of Polyimide–Silica Hybrid from Nonaqueous Sol–Gel Process”, J. Appl. Polymer. Sci., 76, 1609-1618 (2000). (IF:1.072, 34/77)

2. Jem-Kun Chen, Fu-Hsiang Ko, and Feng-Chih Chang, “Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist”, Jpn. J. Appl. Phys, 42, 3838-3841 (2003). (IF:1.069, 41/83)

3. Jem-Kun Chen, Fu-Hsiang Ko, Hsuan-Ko Chen and Cheng-Tung Chou, and Feng-Chih Chang, “Fabrication of Three-dimensional Non-planar Fluidic Channel with Electron Beam Lithography”, J. Vac. Sci. Technol. B, 22(2), 492-500 (2004). (IF:1.626, 26/83)

4. Jem-Kun Chen, I-Kuang Lin, Fu-Hsiang Ko, Shiao-Wei; Su, Chih-Feng Huang, Kuo-Shen Chen, Chia-Hao Chan and Feng-Chih Chang, “Behavior and Surface Energy of Polybenzoxazine Polymerized by Argon, Oxygen, and Hydrogen Plasma, J. Polym. Sci. B, 42, 4063–4074 (2004). (IF:1.739, 18/77)

5. Jem-Kun Chen, Fu-Hsiang Ko, Kuen-Fong Hsieh, Chih-Feng Wang, Cheng-Tung Chouand Feng-Chih Chang,” Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silicon Oxide Surfaces for Nanoimprint”, J. Vac. Sci. Technol. B, 22(6), 3233-3241(2004) (IF:1.626, 26/83)

. 6. Chia-Hao Chan, Jem Kun Chen, Feng-Chih Chang, “In-Situ characterization of Cu CMP slurry and defect reduction using IR thermal camera”, Microelectronic Engineering, 75, 257-262 ( 2004) , (SCI; impact factor : 1.2, 2004). (IF:1.347, 33/83)

7. Lee, Yuan-Jyh; Kuo, Shia o-Wei; Su, Yi-Che; Chen, Jem-Kun; Tu, Cheng-Wei; Chang, Feng-Chih, “Syntheses, thermal properties, and phase morphologies of novel benzoxazines functionalized with polyhedral oligomeric silsesquioxane (POSS) nanocomposites”, Polymer, 45, 6321 (2004) , (SCI; impact factor : 2.3, 2004). (IF:2.849, 7/77)

8. Chih-Feng Huang, Shiao-Wei Kuo, Han-Ching Lin, Jem-Kun Chen, Yu-Kai Chen, Hongyao Xu, Feng-Chih Chang,” Thermal properties, miscibility and specific interactions in comparison of linear and star poly(methyl methacrylate) blend with phenolic”, Polymer, 45, 5139 (2004) , (SCI; impact factor : 2.3, 2004) (IF:2.849, 7/77)

9. Jem-Kun Chen, Fu-Hsiang Ko, Chia-Hao Chan, Chih-Feng Huang, Chih-Feng Wang and Feng-Chih Chang, “Structural Transformation of Acrylic Resin Exhibits Positive and Negative Tones under Electron Beam Irradiation”, Advance Functional Materials, 15(7), 1147-1154(2005).(IF:6.77, 6/178)

10.Jem-Kun Chen, Shiao-Wei Kuo, Fu-Hsiang Ko, Kuen-Fong Hsieh, Hsin-Ching Kao, Chia-Hao, Chan Chih-Feng Wang and Feng-Chih Chang, “Thermal Properties, Specific Interactions, and Surface Energies of PMMA Terpolymers having High Glass Transition Temperatures and Low Moisture Absorptions”, Polymer 46(7), 2354-2364(2005). (IF:2.849, 7/77)

11.Yuan-Jyh Lee, Jieh-Ming Huang, Shiao-Wei Kuo, Jem-Kun Chen, and Feng-Chih Chang, “Synthesis and Characterizations of a Vinyl-Terminated Benzoxazine Monomer and its Blending with Polyhedral Oligomeric Silsesquioxane (POSS)”, Polymer 46(7), 2320-2330(2005). (IF:2.849, 7/77)

12. Huang CF, Kuo SW, Chen JK, Chang FC, “Synthesis and characterization of polystyrene-b-poly(4-vinyl pyridine) block copolymers by atom transfer radical polymerization”, Journal of Polymer Research 12 (6): 449-456, 2005

13.Jem-Kun Chen, Fu-Hsiang Ko, Feng-Chih Chang, “Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers”, Microelectronic Engineering 83, 1132–1137(2006). (IF:1.347, 33/83)

14. Jem-Kun Chen, Fu-Hsiang Ko, Chia-Hao Chan, Chih-Feng Huang, Feng-Chih Chang, “Using imprinting technology to fabricate three-dimensional devices from moulds of thermosetting polymer patterns”, Semicond. Sci. Technol. 21 1213-1220 (2006). (IF:1.222, 63/178)

15. Ko Fu-Hsian, Wu Chia-Tien, Chen Mei-Fen, Chen Jem-Kun, Chu, Tieh-Chi.“ Soft-mold-induced self-construction of polymer patterns under microwave irradiation”, Applied Physics Letters 90 (19), 191901(2007).

16. Wang Chih-Feng, Chiou Shih-Feng, Ko Fu-Hsiang, Chen Jem-Kun, Chou Cheng-Tung, Chang Feng-Chih, “Polybenzoxazine as a mold-release agent for nanoimprint lithography”, Langmuir  23 (11): 5868(2007).

17. Jem-Kun Chen, Chia-Hao Chan and Feng-Chih Chang, “Immobilization of layered double hydroxides in the fluidic system for nanoextraction of specific DNA molecules”, Applied Physics Letters, 92, 053108(2008).

18. Chia-Hao Chan, Jem-Kun Chen,∗, Feng-Chih Chang,” Specific DNA extraction through fluid channels with immobilization of layered double hydroxides on polycarbonate surface”, Sensors and Actuators B 13 3327–332 (2008).

19. Jem Kun Chen, Chia-Hao Chan, and Feng-Chih Chang.” TaNx Thin Films Deposited Through Various Flow Ratios of N2/Ar for Copper Barrier Properties”, Journal of The Electrochemical Society, 155 (11) H852-H857 (2008).

20. Jem-Kun Chen, Chih-Yi Hsieh, Chih-Feng Huang, Po-Min Li, Shiao-Wei Kuo, Feng-Chih Chang,” Using Solvent Immersion to Fabricate Variably Patterned Poly(methyl methacrylate) Brushes on Silicon Surfaces’, Macromolecules, 2008, in press.

 

研討會論文

1.      陳建光、久保田智?、寒川誠二、山下一郎, ????????用????構造?作製, 第52回?用物理??係連合講演?, 埼玉大學,29a-YL-9, 2005/3/29.

2.      陳建光、久保田智?、山下一郎、寒川誠二, ?????????中性粒子????用??作製????構造????, 第66回?用物理???術講演?, 德島大學, 10pc7,2005/9/7.

3.      Jem-Kun Chen, Fu-Hsiang Ko, Kuen-Fong Hsieh, Cheng-Tung Chou, Feng-Chih Chang,” Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silicon Oxide Surfaces for Nanoimprint”, Nanoimprint Processes and Components Session, 48th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), San Diego, California, 201-202 (2004).

4.      Jem-Kun Chen, I-Kuang Lin, Fu-Hsiang Ko, Feng-Chih Chang and Kuo-Shen Chen, “Behavior and Surface Energy of Polybenzoxazine Polymerized by Argon, Oxygen, and Hydrogen Plasma,” International Microprocesses and Nanotechnology Conference (MNC), (2003).

5.      Jem-Kun Chen, F.-H. Ko, H.-K. Chen, C.-T. Chou and H.-L. Chen, “Three-Dimensional Fabrication and Surface Characterization of Novel Non-Planar Devices”, Nanobiology Session, 47th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), Tampa, FL, 201-202 (2003).

6.      Jem-Kun Chen, Fu-Hsiang Ko, Feng-Chih Chang and Hsuen-Li Chen, “Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist,” International Microprocesses and Nanotechnology Conference (MNC), (2002).

7.     Jem-Kun Chen, F. H. Ko, C.-T. Pan and H. L. Chen, “Simultaneous Patterning on ArF Zwitterresist with Variably Shaped Electron Beam Lithography”, 46th EIPBN, Anaheim, CA, 201-202 (2002).

1.      陳建光、久保田智?、寒川誠二、山下一郎, ????????用????構造?作製, 第52回?用物理??係連合講演?, 埼玉大學,29a-YL-9, 2005/3/29.

2.      陳建光、久保田智?、山下一郎、寒川誠二, ?????????中性粒子????用??作製????構造????, 第66回?用物理???術講演?, 德島大學, 10pc7,2005/9/7.

3.      Jem-Kun Chen, Fu-Hsiang Ko, Kuen-Fong Hsieh, Cheng-Tung Chou, Feng-Chih Chang,” Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silicon Oxide Surfaces for Nanoimprint”, Nanoimprint Processes and Components Session, 48th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), San Diego, California, 201-202 (2004).

4.      Jem-Kun Chen, I-Kuang Lin, Fu-Hsiang Ko, Feng-Chih Chang and Kuo-Shen Chen, “Behavior and Surface Energy of Polybenzoxazine Polymerized by Argon, Oxygen, and Hydrogen Plasma,” International Microprocesses and Nanotechnology Conference (MNC), (2003).

5.      Jem-Kun Chen, F.-H. Ko, H.-K. Chen, C.-T. Chou and H.-L. Chen, “Three-Dimensional Fabrication and Surface Characterization of Novel Non-Planar Devices”, Nanobiology Session, 47th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), Tampa, FL, 201-202 (2003).

6.      Jem-Kun Chen, Fu-Hsiang Ko, Feng-Chih Chang and Hsuen-Li Chen, “Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist,” International Microprocesses and Nanotechnology Conference (MNC), (2002).

7.     Jem-Kun Chen, F. H. Ko, C.-T. Pan and H. L. Chen, “Simultaneous Patterning on ArF Zwitterresist with Variably Shaped Electron Beam Lithography”, 46th EIPBN, Anaheim, CA, 201-202 (2002).

1.      陳建光、久保田智?、寒川誠二、山下一郎, ????????用????構造?作製, 第52回?用物理??係連合講演?, 埼玉大學,29a-YL-9, 2005/3/29.

2.      陳建光、久保田智?、山下一郎、寒川誠二, ?????????中性粒子????用??作製????構造????, 第66回?用物理???術講演?, 德島大學, 10pc7,2005/9/7.

3.      Jem-Kun Chen, Fu-Hsiang Ko, Kuen-Fong Hsieh, Cheng-Tung Chou, Feng-Chih Chang,” Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silicon Oxide Surfaces for Nanoimprint”, Nanoimprint Processes and Components Session, 48th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), San Diego, California, 201-202 (2004).

4.      Jem-Kun Chen, I-Kuang Lin, Fu-Hsiang Ko, Feng-Chih Chang and Kuo-Shen Chen, “Behavior and Surface Energy of Polybenzoxazine Polymerized by Argon, Oxygen, and Hydrogen Plasma,” International Microprocesses and Nanotechnology Conference (MNC), (2003).

5.      Jem-Kun Chen, F.-H. Ko, H.-K. Chen, C.-T. Chou and H.-L. Chen, “Three-Dimensional Fabrication and Surface Characterization of Novel Non-Planar Devices”, Nanobiology Session, 47th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), Tampa, FL, 201-202 (2003).

6.      Jem-Kun Chen, Fu-Hsiang Ko, Feng-Chih Chang and Hsuen-Li Chen, “Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist,” International Microprocesses and Nanotechnology Conference (MNC), (2002).

1.      陳建光、久保田智?、寒川誠二、山下一郎, ????????用????構造?作製, 第52回?用物理??係連合講演?, 埼玉大學,29a-YL-9, 2005/3/29.

2.      陳建光、久保田智?、山下一郎、寒川誠二, ?????????中性粒子????用??作製????構造????, 第66回?用物理???術講演?, 德島大學, 10pc7,2005/9/7.

3.      Jem-Kun Chen, Fu-Hsiang Ko, Kuen-Fong Hsieh, Cheng-Tung Chou, Feng-Chih Chang,” Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silicon Oxide Surfaces for Nanoimprint”, Nanoimprint Processes and Components Session, 48th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), San Diego, California, 201-202 (2004).

4.      Jem-Kun Chen, I-Kuang Lin, Fu-Hsiang Ko, Feng-Chih Chang and Kuo-Shen Chen, “Behavior and Surface Energy of Polybenzoxazine Polymerized by Argon, Oxygen, and Hydrogen Plasma,” International Microprocesses and Nanotechnology Conference (MNC), (2003).

5.      Jem-Kun Chen, F.-H. Ko, H.-K. Chen, C.-T. Chou and H.-L. Chen, “Three-Dimensional Fabrication and Surface Characterization of Novel Non-Planar Devices”, Nanobiology Session, 47th Electron, Ion and Photo Beam Technology and Nanofabrication (EIPBN), Tampa, FL, 201-202 (2003).

6.      Jem-Kun Chen, Fu-Hsiang Ko, Feng-Chih Chang and Hsuen-Li Chen, “Mechanism and Modeling of Ring Pattern Formation for Electron Beam Exposure on Zwitterresist,” International Microprocesses and Nanotechnology Conference (MNC), (2002).

7.     Jem-Kun Chen, F. H. Ko, C.-T. Pan and H. L. Chen, “Simultaneous Patterning on ArF Zwitterresist with Variably Shaped Electron Beam Lithography”, 46th EIPBN, Anaheim, CA, 201-202 (2002).

專利

1.陳建光、柯富祥、周正堂、陳宣克、陳學禮,”三維光阻結構的製作方法 九二)智專二(六)01100字第○九二二○六六三四五○號專利。

2.陳建光、柯富祥、陳學禮、潘敬德、趙天生,”利用調變劑量改變阻劑正型或負型特性之微影技術” ,申請中華民國發明專利中。

Internal Journal

1.陳建光、柯富祥、陳學禮、潘敬德,2002,”兩性電子束敏感阻劑研究”,奈米通訊,9卷2期,p.37-40

2.陳建光、柯富祥、陳學禮、潘敬德,2002, ”兩性電子束敏感阻劑研究”,半導體科技,No.27, ,48-51

3.丁志華、蔡來福、陳建光,《厚膜光阻微影系統簡介》, 奈米通訊, 第十卷第二期 30-42 (2003.5)

4.陳建光,高分子奈米刷於生物電子的未來發展與應用”,中華民國高分子學會第七卷第一期電子期刊, p.2-8, (2006).


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