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增強解析度動態光罩積層製造系統與方法
 
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技術名稱
Technology
增強解析度動態光罩積層製造系統與方法
發明人
Inventor
鄭正元, 龍琳兒, 蘇威年, 黃炳照,
所有權人
Asignee
國立臺灣科技大學

專利國家
Country
申請號
Application No.
專利號
Patent No.
中心案號
Serial No.
中華民國 104100963 申請中 1020146TW0
中國 201510132986.2 申請中 1020146CN0
日本 2016-003774 6284961 1020146JP0
美國 14/991,541 US9,862,147B2 1020146US0
 
點閱數:455
技術摘要:
Liquid crystal dynamic photomask additive manufacturing apparatus and method of thereof is presented in the invention. Main components of the apparatus comprise of light source include but not restricted to high-power LED coupled with planar or linear light guide; dynamic photomask implemented as liquid crystal display capable of blocking portions of light; photocurable material, referred to as "resin" sith wide absorption spectrum, covering visible spectrum electromagnetic radiation from 350 to 700 nm resolution; resin tank of special construction.

Method describes sequence of action leading to the manafacturing of three-dimensional object and software techniques to achieve smoother edges and instant triple resolution enhancement.

Constantly decreasing cost of liquid crystal panels and light-emitting diodes and utilizing software techniques to improve resolution insted of expensive and sophisticated optical system, makes current invention very attractive for future commercialization.


 
   




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